Systems for producing demn eutectic

ABSTRACT

A method of producing DEMN eutectic comprises reacting a reactant mixture comprising ethylenediamine and diethylenetriamine with aqueous nitric acid to form a reaction mixture comprising diethylentriamine trinitrate and ethylenediamine dinitrate. The reaction mixture is combined with methylnitroguanidine and nitroguanidine to form an aqueous slurry. Water is removed from the aqueous slurry. A method of producing an energetic composition, and a system for producing DEMN eutectic are also described.

CROSS-REFERENCE TO RELATED APPLICATION

This application is a divisional of U.S. patent application Ser. No.15/582,954, filed May 1, 2017, which will issue as U.S. Pat. No.10,582,954 on Nov. 17, 2020, which application is a divisional of U.S.patent application Ser. No. 13/804,148, filed Mar. 14, 2013, now U.S.Pat. No. 9,650,307, issued May 16, 2017, the disclosure of each of whichis hereby incorporated herein in its entirety by this reference.

TECHNICAL FIELD

The disclosure, in various embodiments, relates generally to methods andsystems for producing a eutectic composition, and to related methods ofproducing energetic compositions. More specifically, the disclosurerelates to methods and systems for producing DEMN eutectic, and torelated methods of producing energetic compositions including the DEMNeutectic.

BACKGROUND

Energetic (e.g., explosive) materials that have reduced sensitivity andincreased performance for use in melt-pour energetic compositions arebeing investigated. One such energetic material is DEMN eutectic, aquaternary eutectic composition of diethylentriamine trinitrate (DETN),ethylenediamine dinitrate (EDDN), methylnitroguanidine (MeNQ), andnitroguanidine (NQ).

In a conventional process of forming DEMN eutectic, the DETN and theEDDN are separately produced by forming distinct aqueous solutions ofdiethylenetriamine (DETA) (i.e., to produce DETN) and ethylenediamine(EDA) (i.e., to produce EDDN), cooling each of the aqueous solutionsbelow 10° C., slowly adding aqueous 70% nitric acid (NHO₃) to each ofthe aqueous solutions while maintaining a reaction temperature at orbelow 25° C., adding ethanol to the resulting reaction mixtures toprecipitate the DETN and the EDDN, cooling and filtering the resultingslurries to form cakes of the DETN and the EDDN, and washing the cakesof the DETN and the EDDN with ethanol to remove residual NHO₃and water.Thereafter, predetermined ratios of the DETN and the EDDN are wettedwith ethanol and combined with predetermined ratios of MeNQ and NQ, theresulting mixture is heated to a temperature of from about 95° C. toabout 105° C. under agitation to remove the ethanol, and the resultingmolten DEMN eutectic is utilized as desired.

Unfortunately, while the foregoing process may produce the DEMNeutectic, the process can be inefficient and cost-prohibitive. Forexample, the process is time and labor intensive, and contaminated wastestreams (e.g., ethanol contaminated with DETN and/or EDDN) generatedthroughout the process (e.g., to form the DETN, to form the EDDN, and toform the DEMN) can require special processing to mitigate health,safety, and environmental concerns related thereto.

It would, therefore, be desirable to have new methods and systems forproducing DEMN eutectic that are efficient, easy to employ,cost-effective, and environmentally friendly as compared to conventionalmethods and systems for producing DEMN eutectic. Such methods andsystems may, for example, facilitate increased adoption and use of DEMNeutectic in military applications.

SUMMARY

Embodiments described herein include methods and systems for producingDEMN eutectic, and related methods of producing energetic materials. Forexample, in accordance with an embodiment described herein, a method ofproducing DEMN eutectic comprises reacting a reactant mixture comprisingethylenediamine and diethylenetriamine with aqueous nitric acid to forma reaction mixture comprising diethylentriamine trinitrate andethylenediamine dinitrate. The reaction mixture is combined withmethylnitroguanidine and nitroguanidine to form an aqueous slurry. Wateris removed from the aqueous slurry.

In additional embodiments, a method of producing an energetic materialcomprises reacting a reactant mixture comprising ethylenediamine anddiethylenetriamine with an aqueous solution comprising from about 60percent by weight nitric acid to about 75 percent by weight nitric acidat a temperature of from about 10° C. to about 90° C. to form a reactionmixture comprising ethylenediamine dinitrate and diethylentriaminetrinitrate and exhibiting a pH within a range of from about 0 to about7. The reaction mixture is combined with methylnitroguanidine andnitroguanidine to form an aqueous slurry. The aqueous slurry is heatedat a temperature of from about 50° C. to about 150° C. and under atleast one of negative pressure and air sparge to form a DEMN eutecticcomprising ethylenediamine dinitrate, diethylentriamine trinitrate,methylnitroguanidine, nitroguanidine, and from about 0.1 percent byweight water to about 2 percent by weight water.

In yet still additional embodiments, a system for producing a DEMNeutectic comprises at least one vessel configured to react a reactantmixture comprising diethylenetriamine and ethylenediamine and aqueousnitric acid at a temperature of from about 10° C. to about 90° C. toproduce a reaction mixture comprising ethylenediamine dinitrate anddiethylentriamine trinitrate, to combine the reaction mixture withmethylnitroguanidine and nitroguanidine to form an aqueous slurry, andto heat the aqueous slurry at a temperature of from about 50° C. toabout 150° C.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is simplified schematic view of a DEMN eutectic productionsystem, in accordance with embodiments of the disclosure.

FIG. 2 is simplified schematic view of a DEMN eutectic productionsystem, in accordance with additional embodiments of the disclosure.

FIG. 3 is a differential scanning calorimetry (DSC) curve for DEMNeutectic produced in accordance with an embodiment of a method of thedisclosure, as described in Example 1 herein.

DETAILED DESCRIPTION

The following description provides specific details, such as materialcompositions, and processing conditions (e.g., temperatures, pressures,flow rates, etc.) in order to provide a thorough description ofembodiments of the present disclosure. However, a person of ordinaryskill in the art will understand that the embodiments of the presentdisclosure may be practiced without employing these specific details.Indeed, the embodiments of the disclosure may be practiced inconjunction with conventional systems and methods employed in theindustry. In addition, only those process components and acts necessaryto understand the embodiments of the present disclosure are described indetail below. A person of ordinary skill in the art will understand thatsome process components (e.g., pipelines, line filters, valves,temperature detectors, flow detectors, pressure detectors, and the like)are inherently included herein and that adding various conventionalprocess components and acts would be in accord with the presentdisclosure. The drawings accompanying the present application are forillustrative purposes only, and are not meant to be actual views of anyparticular material, device, or system. Additionally, elements commonbetween figures may retain the same numerical designation.

Methods and systems for producing DEMN eutectic are described, as arerelated methods of producing energetic compositions including the DEMNeutectic. As used herein, the term “eutectic” means and includes acomposition of at least two constituents that melts substantiallycompletely to form a single liquid at a temperature below the meltingpoint of any of the constituents. Accordingly, as used herein the term“DEMN eutectic” means and includes a composition of DETN, EDDN, MeNQ,and NQ that melts substantially completely to form a single liquid at atemperature below the melting point of any one of the DETN, EDDN, MeNQ,and NQ. In some embodiments, a method of producing DEMN eutecticincludes reacting a reactant mixture including ethylenediamine (EDA) anddiethylenetriamine (DETA) with an aqueous NHO₃ to form a reactionmixture including DETN and EDDN. The reaction mixture is combined withMeNQ and NQ to form an aqueous slurry. Water is removed from the aqueousslurry using heat, and at least one of negative pressure and air spargeto form the DEMN eutectic. The methods and systems of embodiments of thedisclosure may be faster, more efficient, more cost-effective, and moreenvironmentally friendly than conventional methods and systems used toform DEMN eutectic.

A reaction scheme for the preparation of DEMN eutectic according toembodiments of the disclosure is shown below:

The reaction scheme is described in detail below.

Aqueous NHO₃ may be combined with a reactant mixture including EDA andDETA to form a reaction mixture including EDDN and DETN, according tothe following reaction schemes:

The amounts of EDA and DETA included in the reactant mixture may dependon amounts of EDDN and DETN to be included in the DEMN eutectic to beformed. For example, EDA may be included in the reactant mixture in anamount enabling the DEMN eutetic ultimately produced to comprise fromabout 10 percent by weight (wt %) EDDN to about 50 wt % EDDN, such asfrom about 20 wt % EDDN to about 40 wt % EDDN, or from about 25 wt %EDDN to about 35 wt % EDDN. In addition, DETA may be included in thereactant mixture in an amount enabling the DEMN eutetic ultimatelyproduced to comprise from about 10 percent by weight (wt %) DETN toabout 50 wt % DETN, such as from about 20 wt % DETN to about 40 wt %DETN, or from about 25 wt % DETN to about 35 wt % DETN. EDA and DETA areeach commercially available from various sources, such as fromSigma-Aldrich Co. (St. Louis, Mo.). The aqueous NHO₃ may include fromabout 60 wt % NHO₃ to about 75 wt % NHO₃, and from about 40 wt % water(H₂O) to about 25 wt % H₂O. In some embodiments, the aqueous NHO₃includes about 70 wt % NHO₃, and about 30 wt % H₂O. Aqueous nitric acidis commercially available from various sources, such as fromSigma-Aldrich Co. (St. Louis, Mo.), or may be diluted with water toachieve the desired concentration.

The aqueous NHO₃ may be combined with the reactant mixture within anyreaction vessel (e.g., glass-lined reactor, round-bottom flask, etc.)compatible with the conditions of the reaction. The aqueous NHO₃ and thereactant mixture may be simultaneously added to the reaction vessel, ormay be sequentially added to the reaction vessel. If sequentially addedto the reaction vessel, the aqueous NHO₃ may be added to the reactionvessel before the reactant mixture, or the aqueous NHO₃ may be added tothe reaction vessel after the reactant mixture. In additionalembodiments, the EDA and the DETA may be added to the reaction vesselseparately (i.e., rather than as the reactant mixture). The aqueous NHO₃may be combined with the reactant mixture under agitation (e.g.,stirring) and at a sufficient rate to maintain a reaction temperature offrom about 10° C. to about 90° C., such as from about 35° C. to about55° C. A cooling source may, optionally, be used to maintain thereaction temperature within the desired range within the reactionvessel. The amount of the aqueous NHO₃ combined with the reactantmixture may be controlled such that a final pH of the resulting reactionmixture is within a range of from about 0 to about 7, such as from about3 to about 5. If the reaction mixture is too basic undesirable ageingproperties may result. Conversely, if the reaction mixture is too acidicit may be too corrosive for one or more desired applications.

Following formation, the reaction mixture may be combined with NQ andMeNQ to form an aqueous slurry including EDDN, DETN, NQ, MeNQ, andwater. As used herein, the term “aqueous slurry” means and includes asuspension of EDDN, DETN, NQ, and MeNQ in water, a solution of EDDN,DETN, NQ, and MeNQ in water, an emulsion of EDDN, DETN, NQ, and MeNQ inwater, or combinations thereof. Since a person of ordinary skill in theart will recognize whether a particular formulation is a suspension, asolution, an emulsion, or a combination thereof from the context, forthe purposes of readability and claiming the invention, the term“slurry” means and includes a suspension, a solution, an emulsion, or acombination thereof. The amounts of NQ and MeNQ combined with thereaction mixture may depend on amounts of NQ and MeNQ to be included inthe DEMN eutectic to be formed. For example, the amount of NQ combinedwith the reactant mixture may enable the DEMN eutetic ultimatelyproduced to comprise from about 1 wt % NQ to about 10 wt % NQ, such asfrom about 2 wt % NQ to about 8 wt % NQ, or from about 3 wt % NQ toabout 7 wt % NQ. In addition, the amount of MeNQ combined with thereactant mixture may enable the DEMN eutetic ultimately produced tocomprise from about 5 wt % MeNQ to about 40 wt % MeNQ, such as fromabout 10 wt % MeNQ to about 35 wt % MeNQ, or from about 20 wt % MeNQ toabout 30 wt % MeNQ. NQ is commercially available from various sources,such as from Sigma-Aldrich Co. (St. Louis, Mo.). MeNQ may besynthesisized from NQ using conventional processes, which are notdescribed in detail herein.

The NQ and the MeNQ may be simultaneously combined with the reactionmixture (e.g., as a mixture of NQ and MeNQ), or may be sequentially(e.g., separately) combined with the reaction mixture. If sequentiallycombined with the reaction mixture, the NQ may be combined with thereaction mixture before the MeNQ is combined with the reaction mixture,or the NQ may be combined with the reaction mixture after the MeNQ iscombined with the reaction mixture. In some embodiments, the NQ and theMeNQ are sequentially combined with the reaction mixture. The NQ, theMeNQ, or the mixture thereof, may be introduced to (e.g., added to) thereaction mixture in a single aliquot, or in multiple aliquots. Ifcombined with the reaction mixture in multiple aliquots, the NQ, theMeNQ, or the mixture thereof, may be introduced to the reaction mixturein stepwise manner, or in a continuous manner.

The NQ and the MeNQ may each be combined with the reaction mixture in adry state, or at least one of the NQ and the MeNQ may be combined withthe reaction mixture in a wet state. As used herein, the phrase “in adry state” means that a material (e.g., NQ, MeNQ, etc.) is substantiallyfree of the presence of water or another solvent. If in a dry state, atleast one of the NQ and the MeNQ may, for example, be combined with thereaction mixture as a plurality of particles, such as a powder of NQ, apowder of MeNQ, or a powder of NQ and MeNQ. Conversely, as used herein,the phrase “in a wet state” means that a material (e.g., NQ, MeNQ, etc.)is in the presence of (e.g., at least partially dissolved in) water oranother solvent. If in a wet state, at least one of the NQ and the MeNQmay, for example, be combined with the reaction mixture as awater-containing material including water and the at least one of NQ andMeNQ. The water-containing material may include from about 1 wt % water(H₂O) to about 50 wt % H₂O, such as from about 10 wt % H₂O to about 40wt % H₂O, or from about 20 wt % H₂O to about 30 wt % H₂O.

Upon and/or during formation, the aqueous slurry may be heated to atemperature of from about 50° C. to about 150° C., such as from about90° C. to about 110° C. under at least one of negative pressure (e.g., avacuum) and air sparge to remove H₂O. The water may be removed from theaqueous slurry in situ. In additional embodiments, at least one of thereaction mixture, the NQ, and the MeNQ may be heated to the temperatureof from about 50° C. to about 150° C. prior to the formation of theaqueous slurry. For example, the reaction mixture may be heated to thetemperature of from about 50° C. to about 150° C. before introducing theNQ and the MeNQ thereto. The H₂O removed from the aqueous slurry may besubstantially free of EDDN, DETN, NQ, and MeNQ. The H₂O removal processmay continue for a sufficient amount of time to form the DEMN eutectic.The DEMN eutectic may be in a molten (e.g., liquid, melted) state thatincludes from about 0.1 wt % water to about 2 wt % water, such as fromabout 0.3 wt % water to about 0.5 wt % water. The DEMN eutectic mayremain in the molten state at a temperature greater than or equal toabout 90° C. Accordingly, the temperature of the DEMN eutectic may betemporarily maintained at a temperature greater than or equal to about90° C., such as from about 90° C. to about 120° C., or from about 105°C. to about 115° C.

The DEMN eutectic may be utilized as desired. For example, the DEMNeutectic may be poured into a thin sheet and allowed to solidify, and/ormay be formed (e.g., prilled) into particles (e.g., beads, flakes, etc.)of a desired shape (e.g., spherical, hexahedral, ellipsoidal,cylindrical, conical, irregular, etc.) and size for at least one ofstorage and shipment. As another example, the DEMN eutectic may bepoured into a desired configuration (e.g., a grenade body, an artilleryshell, a mortar shell, a bomb casing, a shaped charge, etc.) for adesired end-use application. As an additional example, at least one ofthe molten DEMN eutectic and a solid form (e.g., a powder form) of theDEMN eutectic may be combined with another energetic material to producea DEMN-based energetic composition. The another energetic material maybe at least one of a crystalline energetic material and anon-crystalline energetic material including, but not limited to,crystalline and non-crystalline forms of1,3,5-triaza-1,3,5-trinitocyclohexane (RDX),1,3,5,7-tetraaza-1,3,5,7-tetranitrocyclooctane (HMX),2,4,6-trinitrotoluene (TNT), 2,4,6-triamino-1,3,5-trinitrobenzene(TATB), 3-nitro-1,2,4-triazol-5-one (NTO),4,10-Dinitro-2,6,8,12-tetraoxa-4,10-diaza-tetracyclododecane (TEX),1,1-diamino-2,2-dinitroethene (FOX-7),2,4,6,8,10,12-hexanitro-2,4,6,8,10,12-hexaazaisowtritzitane (CL-20), NQ,or combinations thereof.

FIG. 1 illustrates a DEMN eutectic production system 100 in accordancewith embodiments of the disclosure. As shown in FIG. 1, the DEMNeutectic production system 100 includes a reaction vessel 102. Thereaction vessel 102 may be configured to receive a reactant feed stream104 including DETA and EDA, an aqueous NHO₃ stream 106, and a stream 108of NQ and MeNQ to produce a molten DEMN eutectic stream 110 and a wastewater stream 112. By way of non-limiting example, the reaction vessel102 may be a 5-, 50-, or 500-gallon Pfaudler type glass-lined reactorincluding inlets to receive the reactant feed stream 104, the aqueousNHO₃ stream 106, and the stream 108 of NQ and MeNQ, and outlets toremove the molten DEMN eutectic stream 110 and a waste water stream 112.In additional embodiments, the reaction vessel 102 may be configured toreceive at least one of separate DETA and EDA streams and separate NQand MeNQ streams. In operation, the reaction vessel 102 may receive andcontain the reactant feed stream 104 and the aqueous NHO₃ stream 106 sothat the DETA, EDA, and NHO₃ react in accordance with the methodspreviously described (e.g., at a temperature of from about 10° C. toabout 90° C., and at a pH within a range of from about 0 to about 7) toproduce a reaction mixture including EDDN and DETN. The reaction vessel102 may then receive the stream 108 of NQ and MeMQ, and may combine theNQ and MeMQ with the reaction mixture to form an aqueous slurryincluding EDDN, DETN, MeNQ, NQ, and H₂O. The operating temperature ofthe reaction vessel 102 may be increased (e.g., to a temperature of fromabout 50° C. to about 150° C.), and at least one of negative pressureand air sparging may be applied to remove H₂O (e.g., as steam) from theaqueous slurry and form molten DEMN eutectic in accordance with themethods previously described. The water may be removed from the reactionvessel 102 in situ. The removed H₂O may exit the reaction vessel 102 asthe waste water stream 112, and may be utilized or disposed of asdesired. The molten DEMN eutectic may exit the reaction vessel 102 asthe molten DEMN eutectic stream 110, and may also be utilized asdesired.

In additional embodiments, a DEMN eutectic production system of thedisclosure may be configured as depicted in FIG. 2. As shown in FIG. 2,a DEMN eutectic production system 200 may include a first reactionvessel 202, and a second reaction vessel 204. The first reaction vessel202 may be configured to receive and react a reactant feed stream 206comprising DETA and EDA and at least a portion 209 of an aqueous NHO₃stream 208 to produce a reaction mixture stream 210 comprising EDDN andDETN in accordance with the methods previously described herein (e.g.,at a temperature of from about 10° C. to about 90° C., and at a pHwithin a range of from about 0 to about 7). In turn, the second reactionvessel 204 may be configured to receive the reaction mixture stream 210from the first reaction vessel 202 along with a stream 212 of NQ andMeNQ to form an aqueous slurry of the EDDN, DETN, MeNQ, NQ, and H₂O, andproduce a waste water stream 218 and a molten DEMN eutectic stream 216in accordance with the methods previously described herein (e.g., at atemperature of from about 50° C. to about 150° C., and under at leastone of negative pressure and air sparging). The second reaction vessel204 may, optionally, also be configured to receive another portion 214of the aqueous NHO₃ stream 208 (e.g., to adjust the pH of the aqueousslurry).

The methods and systems of the disclosure may increase productionefficiency, reduce costs, improve yield, and mitigate health, safety,and environmental concerns as compared to conventional methods andsystems for producing DEMN eutetic. For example, the methods and systemsof the disclosure may reduce the number of processing acts and theamount of processing equipment utilized to produce DEMN eutetic ascompared to conventional methods and systems, increasing efficiency(e.g., faster production time), increasing yield, reducing labor andequipment costs, and enhancing safety (e.g., through reduced exposure)relative to such conventional methods and systems. In addition, themethods and systems of the disclosure may reduce the number of materials(e.g., reagents) utilized to produce DEMN eutetic as compared toconventional methods and systems (e.g., which may require the use of anorganic solvent, such as ethanol), reducing material and processingcosts relative to such conventional methods and systems. Furthermore,waste streams (e.g., waste water streams) produced through methods andsystems of the disclosure may be non-volatile and substantially free ofhazardous contaminants (e.g., EDDN, DETN, MeNQ, NQ) as compared to wastestreams (e.g., energetic-contaminated ethanol streams) produced throughconventional methods and systems, enhancing safety, reducing processingcosts, and mitigating environmental concerns relative to suchconventional methods and systems.

The following examples serve to explain some embodiments of thedisclosure in more detail. The examples are not to be construed as beingexhaustive or exclusive as to the scope of the disclosure.

EXAMPLES Example 1

A 25 milliliter (ml) round-bottom flask was fitted with a magneticstirbar. Water (0.75 grams) was added to the 25-ml round-bottom flask,followed by predetermined quantities of DETA and EDA, to form a DETA/EDAsolution. An aqueous 70 wt % NHO₃ solution was added to the DETA/EDAsolution with stirring to form a reaction mixture. A reactiontemperature below about 60° C. was maintained using a cold water bath.The final pH of the reaction mixture was 1. Required quantities of MeNQand NQ were then added to the reaction mixture. The resulting aqueousslurry was heated to a temperature of from about 110° C. to about 120°C., and a vacuum with a slow air-bleed was applied (0.8 bar) until nowater was seen condensing from the molten DEMN eutectic. The molten DEMNeutectic was poured into a polyethylene mold and allowed to solidify.Differential Scanning calorimetry (DSC) analysis was performed on theDEMN eutectic. FIG. 3 illustrates the DSC curve of the DEMN eutecticproduced. The DSC analysis results illustrate that DEMN eutecticproduced through the methods of the disclosure is the same as DEMNeutectic produced through conventional methods.

Example 2

A three-neck, 100-ml round-bottom flask was fitted with a magneticstirbar. Water (3.7 grams) was added to the 100-ml round-bottom flask,followed by predetermined quantities of DETA and EDA, to form a DETA/EDAsolution. An aqueous 70 wt % NHO₃ solution was added to the DETA/EDAsolution with stirring to form a reaction mixture. A reactiontemperature below about 50° C. was maintained using a cold water bath.The final pH of the reaction mixture was 0.2. Predetermined quantitiesof wet (i.e., 25 wt % water) MeNQ and wet (i.e., 25 wt % water) NQ wereadded to the reaction mixture. The resulting aqueous slurry was heatedto a temperature of about 105° C., and a vacuum was applied (0.5 bar)until no water was seen condensing from the molten DEMN eutectic. Themolten DEMN eutectic was poured into a polyethylene mold and allowed tosolidify. The recovered mass of DEMN eutectic was 92% of theoretical.

Example 3

A three-neck, 100-ml round-bottom flask was fitted with a magneticstirbar. An aqueous 70 wt % NHO₃ solution was added to the 100-mlround-bottom flask and cooled to a temperature of about 11° C. Asolution of DETA and EDA was added to the aqueous 70 wt % NHO₃ solutionover 10 minutes. A reaction temperature below about 55° C. wasmaintained using a cold water bath. The final pH of the resultingreaction mixture was between about 3 and about 4. The reaction mixturewas heated to a temperature of about 55° C. to dissolve precipitatedsolids. MeNQ and NQ were then added in the correct ratios to form anaqueous slurry. The aqueous slurry was heated to a temperature of about103° C. under air sparge to obtain a clear, amber colored liquid.

Example 4

A 20-liter (L) reactor was charged with an aqueous 70 wt % NHO₃solution. The aqueous 70 wt % NHO₃ solution was cooled below about 10°C., and a solution of DETA and EDA was added, with agitation, at a ratesufficient to maintain a reaction temperature below about 50° C. Thefinal pH of the resulting reaction mixture was about 4.2. The reactionmixture was immediately transferred to a 5-gallon, stainless steel meltkettle. Steam was applied to the melt kettle and MeNQ and NQ were addedin the correct ratios to form an aqueous slurry. A polyethylene lidfitted with an agitator, air line, thermocouple probe, and vent wasfitted onto the melt kettle. Moderate agitation was started and airsparge was applied at 100 standard cubic feet per hour (scfh) to theaqueous slurry. The heating, agitation, and air sparge were continueduntil the temperature of the molten DEMN eutectic approached the steamtemperature (i.e., from about 111° C. to about 118° C.), and remainedconstant for 1 hour. The heating, stirring, and air sparge were thendiscontinued, and the molten DEMN eutectic was poured out onto astainless steel pan to solidify. The recovered mass of DEMN eutectic(i.e., about 54 pounds) was about 98% of theoretical.

While the disclosure is susceptible to various modifications andalternative forms, specific embodiments have been shown by way ofexample in the drawings and have been described in detail herein.However, the disclosure is not intended to be limited to the particularforms disclosed. Rather, the disclosure is to cover all modifications,equivalents, and alternatives falling within the scope of the presentinvention as defined by the following appended claims and their legalequivalents.

1. A system for producing DEMN eutectic, comprising: a single reactionvessel configured to react a reactant mixture comprisingdiethylenetriamine and ethylenediamine and aqueous nitric acid at atemperature of from about 10° C. to about 90° C. to produce a reactionmixture comprising ethylenediamine dinitrate and diethylentriaminetrinitrate, to combine the reaction mixture with methylnitroguanidineand nitroguanidine to form an aqueous slurry, and to heat the aqueousslurry at a temperature of from about 50° C. to about 150° C. 2.(canceled)
 3. The system of claim 1, wherein the single reaction vesselis a glass-lined reactor.
 4. The system of claim 3, further comprising:at least one source of diethylenetriamine and ethylenediamine in fluidcommunication with the glass-lined reactor; at least one source ofaqueous nitric acid in fluid communication with the glass-lined reactor;and at least one source of methylnitroguanidine and nitroguanidine influid communication with the glass-lined reactor.
 5. The system of claim3, wherein the glass-lined reactor comprises: a first inlet configuredand positioned to receive a reactant feed stream comprisingdiethylenetriamine and ethylenediamine; a second inlet configured andpositioned to receive an aqueous nitric acid stream comprising aqueousnitric acid; a third inlet configured and positioned to receive anotherreactant feed stream comprising methylnitroguanidine and nitroguanidine;a first outlet configured and positioned to remove molten DEMN eutecticfrom the glass-lined reactor as a molten DEMN eutectic stream; and asecond outlet configured to remove produced water from the from theglass-lined reactor as a waste water stream.
 6. The system of claim 3,further comprising: at least one cooling device configured andpositioned to maintain a temperature within the glass-lined reactor atfrom about 35° C. to about 55° C. during the formation of the reactionmixture; and at least one heating device configured and positioned toheat the aqueous slurry to another temperature within a range of fromabout 90° C. to about 110° C. within the glass-lined reactor.
 7. Thesystem of claim 3, further comprising one or more of: at least one airsparge device configured and positioned to deliver air into the aqueousslurry within the glass-lined reactor; and at least one vacuum deviceconfigured and positioned to apply negative pressure to the aqueousslurry within the glass-lined reactor.
 8. A DEMN eutectic productionsystem, comprising: a source of diethylenetriamine and ethylenediamine;a source of aqueous nitric acid; a source of source ofmethylnitroguanidine and nitroguanidine; and a glass-lined reactor,comprising: a first inlet configured and positioned to receive thediethylenetriamine and the ethylenediamine from the source ofdiethylenetriamine and ethylenediamine; a second inlet configured andpositioned to receive the aqueous nitric acid from the source of aqueousnitric acid; a third inlet configured and positioned to receive themethylnitroguanidine and nitroguanidine from the source of source ofmethylnitroguanidine and nitroguanidine; a first outlet configured andpositioned to remove molten DEMN eutectic produced within theglass-lined reactor; and a second outlet configured to remove steamproduced within the glass-lined reactor.
 9. The DEMN eutectic productionsystem of claim 8, further comprising a cooling device operativelyassociated with the glass-lined reactor and configured to maintain anoperating temperature of the glass-lined reactor within a range of fromabout 10° C. to about 90° C. to produce a reaction mixture comprisingethylenediamine dinitrate and diethylentriamine trinitrate from thediethylenetriamine, the ethylenediamine, and the aqueous nitric acidreceived by the glass lined reactor.
 10. The DEMN eutectic productionsystem of claim 9, further comprising a heating device operativelyassociated with the glass-lined reactor and configured to heat acombination of the reaction mixture and each of the methylnitroguanidineand the nitroguanidine received by the glass lined reactor totemperature within a range of from about 50° C. to about 150° C.
 11. TheDEMN eutectic production system of claim 10, further comprising anegative pressure apparatus operatively associated with the glass-linedreactor and configured to apply negative pressure to an aqueous slurryheated to the temperature and comprising water, the ethylenediaminedinitrate, the diethylentriamine trinitrate, the methylnitroguanidine,and the nitroguanidine heated to the temperature to remove the waterfrom the aqueous slurry in situ and produce the molten DEMN eutectic.12. The DEMN eutectic production system of claim 10, further comprisingan air sparge apparatus operatively associated with the glass-linedreactor and configured to sparge an aqueous slurry heated to thetemperature and comprising water, the ethylenediamine dinitrate, thediethylentriamine trinitrate, the methylnitroguanidine, and thenitroguanidine with air to remove the water from the aqueous slurry insitu and produce the molten DEMN eutectic.
 13. The DEMN eutecticproduction system of claim 8, further comprising a mold structureconfigured and positioned to receive the molten DEMN eutectic exitingthe first outlet of the glass-lined reactor and to solidify the moltenDEMN eutectic into DEMN eutectic.
 14. The DEMN eutectic productionsystem of claim 13, wherein the mold structure comprises polyethylene.15. A system for DEMN eutectic production, comprising: a source ofdiethylenetriamine and ethylenediamine; a source of aqueous nitric acid;a source of methylnitroguanidine and nitroguanidine; and a glass-linedreactor in fluid communication with each of the source ofdiethylenetriamine and ethylenediamine, the source of aqueous nitricacid, and the source of methylnitroguanidine and nitroguanidine, theglass-lined reactor configured to: receive and react thediethylenetriamine and the ethylenediamine in the presence of theaqueous nitric acid and at a first temperature within a range of fromabout 10° C. to about 90° C. to produce a reaction mixture comprisingethylenediamine dinitrate and diethylentriamine trinitrate, combine thereaction mixture with the methylnitroguanidine and the nitroguanidine toform an aqueous slurry, and heat and remove water from the aqueousslurry at a second temperature within a range of from about 50° C. toabout 150° C. to form molten DEMN eutectic.
 16. The system of claim 15,wherein the glass-lined reactor comprises: a inlet in fluidcommunication with the source of diethylenetriamine and ethylenediaminean additional inlet in fluid communication with the source of aqueousnitric acid; a further inlet in fluid communication with the source ofmethylnitroguanidine and nitroguanidine; an outlet configured tofacilitate removal of the molten DEMN eutectic; and an additional outletconfigured to facilitate removal of the water removed from the aqueousslurry separate from the molten DEMN eutectic.
 17. The system of claim15, further comprising a water-cooled device operatively associated withthe glass-lined reactor and configured to facilitate the firsttemperature.
 18. The system of claim 15, further comprising a heatingapparatus operatively associated with the glass-lined reactor andconfigured to facilitate the second temperature.
 19. The system of claim15, further comprising a polyethylene vessel configured and positionedto receive the molten DEMN eutectic from the glass-lined reactor and tofacilitate the solidification of the molten DEMN eutectic.
 20. Thesystem of claim 15, further comprising an air sparge device operativelyassociated with the glass-lined reactor.